Searched refs:w_comp_inv_p3 (Results 1 - 4 of 4) sorted by relevance

/gem5/ext/mcpat/cacti/
H A Dparameter.h187 double w_comp_inv_p3; member in class:TechnologyParameter
H A Dmat.cc1376 Ceq = gate_C(g_tp.w_comp_inv_n3 + g_tp.w_comp_inv_p3, 0, is_dram) +
1391 drain_C_(g_tp.w_comp_inv_p3, PCH, 1, 1, g_tp.cell_h_def, is_dram) +
1393 Req = tr_R_on(g_tp.w_comp_inv_p3, PCH, 1, is_dram);
1398 lkgCurrent += cmos_Isub_leakage(g_tp.w_comp_inv_n3, g_tp.w_comp_inv_p3, 1,
1400 gatelkgCurrent += cmos_Ig_leakage(g_tp.w_comp_inv_n3, g_tp.w_comp_inv_p3,
H A Dparameter.cc122 cout << indent_str << "w_comp_inv_p3 = " << setw(12) << w_comp_inv_p3 << " um" << endl;
H A Dtechnology.cc1735 g_tp.w_comp_inv_p3 = 50 * g_ip->F_sz_um;//this was 40 micron for the 0.8 micron process

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